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Intel EUV Lithography For 32nm In 2009

Intel has reached another milestone on the path to developing a new chip manufacturing technology that will keep its factories humming well into the future. Intel plans to reveal on Monday that it has installed the first commercial extreme ultraviolet light photolithography tool in a development facility on its Hillsboro, Ore., campus. Intel will use the EUV lithography tool–which “draws” lines on silicon wafers that eventually become metal circuits–to help refine a new manufacturing process that it expects to adopt during 2009. EUV lithography will come into play when Intel starts to make chips with an average feature size of 32 nanometers. Although it got in on EUV early, Intel probably won’t be the only chipmaker to use the technology. Others, including AMD, IBM, Infineon, Micron Technologies and Motorola, have joined the EUV LLC.

Intel has reached another milestone on the path to developing a new chip manufacturing technology that will keep its factories humming well into the future. Intel plans to reveal on Monday that it has installed the first commercial extreme ultraviolet light photolithography tool in a development facility on its Hillsboro, Ore., campus. Intel will use the EUV lithography tool–which “draws” lines on silicon wafers that eventually become metal circuits–to help refine a new manufacturing process that it expects to adopt during 2009. EUV lithography will come into play when Intel starts to make chips with an average feature size of 32 nanometers. Although it got in on EUV early, Intel probably won’t be the only chipmaker to use the technology. Others, including AMD, IBM, Infineon, Micron Technologies and Motorola, have joined the EUV LLC.

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